Toyokawa, Japan

Kenichi Kadena

This inventor holds 1 USPTO granted patent. Top assignee: Konica Minolta, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenichi Kadena. Retrieved from https://idiyas.com/inventor/kenichi-kadena

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kenichi Kadena: Innovator in Manufacturing Optimization

Introduction

Kenichi Kadena is a notable inventor based in Toyokawa, Japan. He has made significant contributions to the field of manufacturing optimization. His work focuses on enhancing the efficiency and quality of manufacturing processes.

Latest Patents

Kadena holds a patent for a "Manufacturing condition optimization apparatus, computer program product, and manufacturing condition optimization method." This innovative apparatus includes a yield estimator that estimates the yield of a product that passes inspection when manufacturing conditions are altered. Additionally, it features an optimization processor that calculates the optimal change in manufacturing conditions to maximize yield. He has 1 patent to his name.

Career Highlights

Kenichi Kadena is currently employed at Konica Minolta, Inc., where he applies his expertise in manufacturing optimization. His work has been instrumental in improving production processes and ensuring product quality.

Collaborations

Kadena has collaborated with notable colleagues, including Ryuji Kamata and Isamu Hisamitsu. Their combined efforts contribute to advancements in manufacturing technologies.

Conclusion

Kenichi Kadena's innovative work in manufacturing optimization showcases his commitment to enhancing production efficiency. His contributions are vital to the ongoing evolution of manufacturing practices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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