Annaka, Japan

Ken Sunakawa

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2000-2023

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3 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Ken Sunakawa

Introduction

Ken Sunakawa, an accomplished inventor based in Annaka, Japan, has made significant contributions to the field of materials science and semiconductor technology. With three patents to his name, Sunakawa has been at the forefront of innovations that enhance the performance and quality of silicon wafers used in various applications.

Latest Patents

Sunakawa’s most recent patents include groundbreaking methods for manufacturing and heat-treating silicon single crystal wafers. One notable patent is for a carbon-doped silicon single crystal wafer and the method for manufacturing it. This innovative approach entails preparing a silicon single crystal wafer that is not doped with carbon, followed by a series of rapid thermal annealing (RTA) treatments in a carbon-containing atmosphere. The result is a modified wafer featuring a high carbon concentration across its surface layer, allowing for enhanced strength and durable performance.

His other patent focuses on a method for heat-treating silicon single crystal wafers to achieve desired BMD (Boron Macro Defect) density. By performing precise heat treatments in a nitriding atmosphere, Sunakawa’s method formulates a relational equation that helps determine the optimal RTA temperature necessary to create defect-free wafers with specified BMD densities.

Career Highlights

Ken Sunakawa is a prominent member of Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His role encompasses research and development aimed at advancing wafer technology that is pivotal for modern electronics. His commitment to innovation and excellence has established him as a respected voice in his field.

Collaborations

Throughout his career, Sunakawa has collaborated with talented professionals, including Kiichiro Asako and Toko Yagi. This teamwork has fostered an environment of creativity and technical expertise, contributing to the successful development of Sunakawa's patented technologies.

Conclusion

Ken Sunakawa exemplifies the innovative spirit that drives advancements in the semiconductor industry. His patents, focusing on carbon-doping techniques and wafer heat treatments, underscore his dedication to enhancing material performance. As he continues his work at Shin-Etsu Handotai Co., Ltd., the impact of his inventions is sure to influence the future of technology in significant ways.

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