Location History:
- Hitachi, JP (2008 - 2016)
- Tokyo, JP (2020)
Company Filing History:
Years Active: 2008-2020
Title: Ken Sawabe: Innovator in Photosensitive Resin Technology
Introduction
Ken Sawabe is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of six patents. His work focuses on developing advanced materials that enhance the performance and efficiency of electronic components.
Latest Patents
Ken Sawabe's latest patents include a variety of innovative technologies. One of his notable inventions is a photosensitive resin composition that comprises a binder polymer with specific structural units, a photopolymerizable compound, a photopolymerization initiator, and a styryl pyridine. This composition is designed to improve the production of substrates with resist patterns and printed wiring boards. Another significant patent involves a positive-type photosensitive resin composition that includes modified novolac-type phenol resins and compounds that generate acid upon exposure to light.
Career Highlights
Ken Sawabe is currently employed at Hitachi Chemical Company, Ltd., where he continues to push the boundaries of materials science. His innovative work has not only advanced the field but has also contributed to the development of more efficient electronic devices.
Collaborations
Throughout his career, Ken has collaborated with talented individuals such as Hanako Yori and Masahiko Ogino. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Ken Sawabe's contributions to photosensitive resin technology exemplify the spirit of innovation. His patents reflect a commitment to advancing materials science and improving electronic manufacturing processes. His work continues to influence the industry and inspire future inventors.