This inventor holds 2 USPTO granted patents. Top assignee: Jsr Corporation. Active years: 2016-2017.
Company Filing History:
Years Active: 2016-2017
Title: Ken Nakakura: Innovator in Photoresist Technology
Introduction
Ken Nakakura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of methods and compositions that enhance substrate processing.
Latest Patents
Ken Nakakura holds 2 patents related to resist pattern-forming methods and photoresist compositions. His latest patents include a resist pattern-forming method that involves providing a resist film using a specific photoresist composition, exposing the resist film, and developing the exposed resist film. The photoresist composition contains a polymer with a weight average molecular weight ranging from 1,000 to 7,500, which includes an acid-labile group that is dissociated by an acid's action. Additionally, it features a radiation-sensitive acid generator and a solvent composition, with a solid content between 20% and 60% by mass. The composition is designed to have a viscosity between 50 mPa·s and 150 mPa·s at 25°C.
Career Highlights
Ken Nakakura is currently employed at JSR Corporation, where he continues to innovate in the field of photoresist technology. His work has been instrumental in advancing the capabilities of substrate processing methods.
Collaborations
Throughout his career, Ken has collaborated with notable coworkers, including Yuichiro Katsura and Ryu Matsumoto. These collaborations have contributed to the development of cutting-edge technologies in the industry.
Conclusion
Ken Nakakura is a key figure in the realm of photoresist technology, with a focus on innovative methods and compositions that enhance substrate processing. His contributions continue to shape the future of this important field.