San Diego, CA, United States of America

Ken Liao

This inventor holds 1 USPTO granted patent. Top assignee: Qualcomm Incorporated. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ken Liao. Retrieved from https://idiyas.com/inventor/ken-liao-ipyjr4gc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Ken Liao: Innovator in Metal Oxide Semiconductor Technology

Introduction

Ken Liao is a prominent inventor based in San Diego, California. He has made significant contributions to the field of semiconductor technology, particularly in improving the quality factor of metal oxide semiconductor varactors. His innovative work has garnered attention in the industry and has led to the development of valuable patents.

Latest Patents

Ken Liao holds a patent for a self-aligned contact (SAC) on the gate, aimed at enhancing the quality factor of metal oxide semiconductor (MOS) varactors. This patent describes a short-channel metal oxide semiconductor varactor that includes a source region and a drain region of a first polarity, each having respective via contacts. The design features a channel region that incorporates a gate, along with at least one self-aligned contact positioned on the gate and situated between the source and drain via contacts. This innovation is crucial for advancing the performance of MOS varactors.

Career Highlights

Ken Liao is currently employed at Qualcomm Incorporated, a leading company in the telecommunications and semiconductor industry. His work at Qualcomm has allowed him to focus on cutting-edge technologies and contribute to the development of advanced semiconductor solutions. His expertise and innovative mindset have positioned him as a valuable asset to the company.

Collaborations

Ken has collaborated with notable coworkers, including Ye Lu and Yun Yue. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Ken Liao's contributions to the field of metal oxide semiconductor technology exemplify the impact of innovation in the industry. His patent for the self-aligned contact on the gate demonstrates his commitment to enhancing semiconductor performance. Through his work at Qualcomm and collaborations with talented colleagues, Ken continues to push the boundaries of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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