Location History:
- Hyogo, JP (1994 - 1996)
- Tokyo, JP (2006 - 2011)
Company Filing History:
Years Active: 1994-2011
Title: Ken-ichi Ohtsuka: Innovator in Semiconductor Technology
Introduction
Ken-ichi Ohtsuka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving the performance and manufacturing methods of semiconductor devices.
Latest Patents
One of his latest patents is a semiconductor device and semiconductor device manufacturing method. This invention utilizes a SiC substrate, ensuring that the Junction Termination Edge (JTE) layer is minimally affected by fixed charge, which results in stable dielectric strength. The semiconductor device includes a SiC epi-layer with n-type conductivity, an impurity region with p-type conductivity, and JTE layers that are adjacent to the impurity region. These JTE layers have a lower impurity concentration and are spaced from the upper surface of the SiC epi-layer.
Another notable patent is a method of manufacturing a SiC vertical MOSFET. This invention addresses the trade-off between channel resistance and JFET resistance, which has been a barrier to device miniaturization. The method allows for the formation of a source region and a base region using the same tapered mask through ion implantation, enhancing the efficiency of the manufacturing process.
Career Highlights
Ken-ichi Ohtsuka has worked with several esteemed companies, including Mitsubishi Denki Kabushiki Kaisha and Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Throughout his career, Ohtsuka has collaborated with notable individuals such as Hiroshi Sugimoto and Yoichiro Tarui. These collaborations have further enriched his work and expanded the impact of his inventions in the semiconductor field.
Conclusion
Ken-ichi Ohtsuka is a distinguished inventor whose contributions to semiconductor technology have paved the way for advancements in the industry. His innovative patents and collaborations reflect his commitment to enhancing the performance and manufacturing of semiconductor devices.