This inventor holds 3 USPTO granted patents. Top assignees: Anelva Corporation, Nec Corporation. Active years: 1993-1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
3 out of 256 
3 out of 36,718 
Years Active: 1993-1995
Title: Ken-ichi Aketagawa: Innovator in Thin Film Deposition Technology
Introduction
Ken-ichi Aketagawa is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of thin film deposition technology, holding a total of 3 patents. His work has advanced the methods and apparatus used in the creation of thin films, which are essential in various technological applications.
Latest Patents
One of Aketagawa's latest patents is a thin film deposition method for wafers. This method involves placing a wafer or substrate with at least two kinds of materials inside a vacuum chamber. A reactant gas is supplied into the chamber, which contains molecules with a low sticking coefficient relative to at least one of the materials. This allows for epitaxial growth on the other materials present in the wafer. The method also specifies maintaining a pressure in the chamber that ensures the mean free path of the gas molecules is longer than the distance to the chamber wall, facilitating effective thin film creation.
Another significant patent is a vacuum film forming apparatus. This apparatus features a vacuum vessel divided into two chambers, each equipped with its own evacuating means. A substrate heater is located in the first chamber, while gas supplying means are arranged in the second chamber. The design ensures that the substrate holder, which holds the substrate, is gastightly isolated between the two chambers, optimizing the film formation process.
Career Highlights
Throughout his career, Ken-ichi Aketagawa has worked with prominent companies such as Anelva Corporation and NEC Corporation. His experience in these organizations has contributed to his expertise in thin film technologies and patent development.
Collaborations
Aketagawa has collaborated with notable colleagues, including Junro Sakai and Toru Tatsumi. These partnerships have likely enriched his work and led to innovative advancements in his field.
Conclusion
Ken-ichi Aketagawa is a distinguished inventor whose work in thin film deposition technology has made a lasting impact. His patents reflect a deep understanding of the complexities involved in film formation, showcasing his innovative spirit and technical expertise.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile