West Henrietta, NY, United States of America

Ken Gottschalk

This inventor holds 1 USPTO granted patent. Top assignee: Xerox Corporation. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ken Gottschalk. Retrieved from https://idiyas.com/inventor/ken-gottschalk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Ken Gottschalk: Innovator in Surface Flaw Detection

Introduction

Ken Gottschalk is a notable inventor based in West Henrietta, NY (US). He has made significant contributions to the field of surface flaw detection, particularly through his innovative patent. His work is recognized for its practical applications in various industries.

Latest Patents

Ken Gottschalk holds a patent for a method and apparatus for detecting low frequency specular surface flaws on coated substrates. The patent describes a process that involves impinging visible electromagnetic radiation onto a coated substrate at an oblique angle. This method allows for the reflection of the radiation off the substrate onto a screen material, creating a specular surface flaw reflected image. The reflected image is then recorded using a photosensitive device, resulting in a documented representation of the surface flaws.

Career Highlights

Ken Gottschalk is associated with Xerox Corporation, where he has applied his expertise in developing advanced technologies. His work at Xerox has allowed him to explore innovative solutions that enhance product quality and reliability.

Collaborations

Throughout his career, Ken has collaborated with talented individuals such as Kamran U Zaman and Stanley Pietrzykowski. These collaborations have contributed to the advancement of technology in the field of surface flaw detection.

Conclusion

Ken Gottschalk's contributions to the field of surface flaw detection exemplify the impact of innovation in technology. His patent and work at Xerox Corporation highlight the importance of addressing quality control in coated substrates.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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