Hitachinaka-city, Japan

Ken Asakura

This inventor holds 1 USPTO granted patent. Top assignees: Eppendorf Himac Technologies Co., Ltd., Horiba, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ken Asakura. Retrieved from https://idiyas.com/inventor/ken-asakura-l9y5d3cj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ken Asakura: Inventor of a Centrifugal Particle-Measurement Device.

Introduction

Ken Asakura is an inventor associated with Hitachinaka-city, Japan. His work includes a patent for a device that measures particle-size distributions using centrifugal sedimentation. The available information lists 1 patent for him.

Latest Patents

Asakura’s listed patent is titled “Centrifugal Sedimentation-Type Particle Diameter Distribution Measurement Device.” The invention holds a measurement cell containing a sample and dispersion medium, then rotates the cell to apply centrifugal force. A light source shines through the cell, and a photodetector measures the transmitted light. An arithmetic section uses the resulting light-intensity signal to calculate the particle-size distribution. The patent also positions a rotating region of the cover within the optical path between the light source and photodetector.

Career Highlights

The provided career information associates Asakura with Horiba, Ltd. and Eppendorf Himac Technologies Co., Ltd. His patented device reflects work in particle measurement and analytical instrumentation.

Collaborations

The listed coworkers include Tetsuji Yamaguchi and Yuki Shimizu. The available information does not specify their roles in the patent or their particular collaborations with Asakura.

Conclusion

Ken Asakura’s listed invention combines centrifugal sedimentation and optical measurement to determine particle-size distributions, connecting his patent record with analytical instrumentation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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