Kelsee L Coykendall

Title: Kelsee L Coykendall: Innovator in Polymer Materials

Introduction

Kelsee L Coykendall is a prominent inventor based in Henrietta, NY (US). She has made significant contributions to the field of polymer materials, particularly in the development of low outgassing photo or electron beam curable rubbery polymer materials. With a total of 2 patents, her work is paving the way for advancements in various optical applications.

Latest Patents

Kelsee's latest patents include innovative compositions that are both photo and electron beam polymerizable. The first patent focuses on a low outgassing photo or electron beam curable rubbery polymer material, which is ideal for use in lithographic tools. This composition is designed to be free of carbon-carbon double and triple bonds, making it suitable for applications that require low outgassing properties. The second patent details a device comprising this low outgassing polymer material, emphasizing its utility as an adhesive, sealant, or lens potting material in optical devices.

Career Highlights

Kelsee L Coykendall is currently employed at Corning Incorporated, where she continues to innovate in the field of polymer materials. Her work is instrumental in enhancing the performance of lithographic tools and other optical devices.

Collaborations

Kelsee has collaborated with notable coworkers such as Paul Gerard Dewa and Robert Sabia, contributing to a dynamic team focused on advancing polymer technology.

Conclusion

Kelsee L Coykendall's contributions to the field of polymer materials are noteworthy and impactful. Her innovative patents and work at Corning Incorporated highlight her role as a leading inventor in this specialized area.