The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
Nov. 07, 2003
Kelsee L. Coykendall, Henrietta, NY (US);
Paul G. Dewa, Newark, NY (US);
Robert Sabia, Corning, NY (US);
David C. Sauer, Horseheads, NY (US);
Paul J. Shustack, Elmira, NY (US);
Kamal K. Soni, Painted Post, NY (US);
Kelsee L. Coykendall, Henrietta, NY (US);
Paul G. Dewa, Newark, NY (US);
Robert Sabia, Corning, NY (US);
David C. Sauer, Horseheads, NY (US);
Paul J. Shustack, Elmira, NY (US);
Kamal K. Soni, Painted Post, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.