Keke Ma

Title: Keke Ma: Innovator in Gallium Oxide Semiconductor Technology

Introduction

Keke Ma is a prominent inventor based in Hangzhou, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for growing gallium oxide single crystals. His work is crucial for advancing the capabilities of semiconductor devices.

Latest Patents

Keke Ma holds a patent for a "Method for growing gallium oxide single crystal by casting and semiconductor device containing gallium oxide single crystal." This patent outlines a method that involves heating solid gallium oxide to complete melting, followed by a controlled cooling process to obtain a solid gallium oxide single crystal. The method ensures that oxygen is present in the growth atmosphere, which is essential for the quality of the crystal produced.

Career Highlights

Keke Ma is associated with Hangzhou Garen Semiconductor Co., Ltd., where he applies his expertise in semiconductor technology. His innovative approach to gallium oxide crystal growth has positioned him as a key figure in the semiconductor industry. His work not only enhances the performance of semiconductor devices but also contributes to the overall advancement of technology in this field.

Collaborations

Keke Ma collaborates with talented individuals such as Ning Xia and Hui Zhang. Their combined efforts in research and development have led to significant advancements in semiconductor technology.

Conclusion

Keke Ma's contributions to gallium oxide semiconductor technology exemplify the impact of innovative thinking in the field. His patent and work at Hangzhou Garen Semiconductor Co., Ltd. highlight the importance of research and collaboration in driving technological advancements.