The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2024

Filed:

Jul. 13, 2022
Applicant:

Hangzhou Garen Semiconductor Co., Ltd., Hangzhou, CN;

Inventors:

Ning Xia, Hangzhou, CN;

Hui Zhang, Hangzhou, CN;

Keke Ma, Hangzhou, CN;

Yingying Liu, Hangzhou, CN;

Deren Yang, Hangzhou, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 11/06 (2006.01); C30B 11/00 (2006.01); C30B 29/16 (2006.01);
U.S. Cl.
CPC ...
C30B 11/003 (2013.01); C30B 11/06 (2013.01); C30B 29/16 (2013.01);
Abstract

The disclosure provides a method for growing a gallium oxide single crystal by casting and a semiconductor device containing the gallium oxide single crystal. The method includes: 1) heating a solid gallium oxide to complete melting, cooling to a melting point of the gallium oxide, and maintaining a melt state for at least 30 min; and 2) conducting gradient cooling on a gallium oxide melt obtained in step 1) until a solid gallium oxide single crystal is obtained. The gradient cooling is to cool the gallium oxide melt obtained in step 1) to a first temperature according to a first gradient, and then continue cooling to a room temperature according to a second gradient to obtain the gallium oxide single crystal. In step 1), since the solid gallium oxide is heated to the first temperature, oxygen with a volume fraction of at least 2% is present in a growth atmosphere.


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