Location History:
- Kamakura, JP (1991)
- Ohi, JP (1988 - 1993)
Company Filing History:
1 out of 220 
1 out of 141 
1 out of 39 Years Active: 1988-1993
Title: Keitaro Fukui: Innovator in Thin Film Technology
Introduction
Keitaro Fukui is a notable inventor based in Ohi, Japan. He has made significant contributions to the field of thin film technology, particularly in the development of polycrystalline silicon thin films and superconducting films. With a total of 3 patents to his name, Fukui's work has implications for various applications, including liquid crystal displays.
Latest Patents
Fukui's latest patents include a method for creating a polycrystalline silicon thin film and a transistor using the same. This invention allows for the formation of a polycrystalline silicon thin film with a large crystal grain size on substrates other than single crystalline silicon, such as glass. The resulting film exhibits excellent flatness and is suitable for microstructure fabrication and thin film transistor manufacturing. Additionally, he has developed a method for forming oxide superconducting films using an ultrasonic wave. This technique involves atomizing and spraying a homogeneous solution onto a hot substrate, resulting in a thin film of a superconductor comprising composite metal oxides.
Career Highlights
Throughout his career, Fukui has worked with prominent companies, including Toa Nenryo Kogyo Kabushiki Kaisha and Tonen Corporation. His experience in these organizations has contributed to his expertise in thin film technology and innovation.
Collaborations
Fukui has collaborated with notable individuals in his field, including Osamu Nakamura and Yasushi Okayama. These partnerships have likely enhanced his research and development efforts.
Conclusion
Keitaro Fukui's contributions to thin film technology and his innovative patents demonstrate his significant impact on the industry. His work continues to influence advancements in various applications, particularly in electronics and superconductivity.