This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Sunline Co., Ltd., Other. Active years: 2019-2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019-2024
Title: Keita Suizu: Innovator in Yarn and Plasma Treatment Technologies
Introduction
Keita Suizu is a notable inventor based in Iwakuni, Japan. He has made significant contributions to the fields of yarn production and plasma treatment technologies. With a total of 2 patents, Suizu's work reflects his commitment to innovation and advancement in material science.
Latest Patents
Suizu's latest patents include a yarn and method of producing the same. The objective of this invention is to provide a yarn with a core-sheath structure that inhibits delamination between the core and the sheath. This yarn features a core made of polyamide and a sheath composed of fluororesin, which contains an adhesive functional group and has a melting point ranging from 220 to 250° C. Another significant patent is a plasma treatment method, which involves subjecting a long object to plasma treatment by placing it in contact with plasma. This method ensures that the surface of the long object is thoroughly and uniformly treated by selectively passing it through areas of varying plasma density.
Career Highlights
Throughout his career, Keita Suizu has worked with various companies, including Sunline Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative technologies.
Collaborations
Suizu has collaborated with notable coworkers such as Takashi Ogawa and Akitoshi Okino. Their joint efforts have likely played a role in advancing the projects they have worked on together.
Conclusion
Keita Suizu's contributions to yarn production and plasma treatment technologies highlight his innovative spirit and dedication to improving material science. His patents reflect a deep understanding of the complexities involved in these fields, making him a significant figure in the world of invention.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile