The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
Apr. 08, 2013
Sunline Co., Ltd., Iwakuni-shi, Yamaguchi, JP;
Hidekazu Miyahara, Tokyo, JP;
Akitoshi Okino, Tokyo, JP;
Akitoshi Okino, Tokyo, JP;
Hidekazu Miyahara, Tokyo, JP;
Hidenobu Tsutsumi, Iwakuni, JP;
Junji Nakazaki, Iwakuni, JP;
Takashi Ogawa, Iwakuni, JP;
Keita Suizu, Iwakuni, JP;
SUNLINE CO., LTD., Iwakuni-Shi, JP;
Other;
Abstract
A plasma treatment method subjects a long object to be treated to plasma treatment by placing the long object to be treated in contact with plasma, the density distribution of which varies while selectively passing the long object to be treated through an area having high plasma density so that a surface of the long object can be thoroughly and uniformly subjected to plasma treatment. The method is applied to a plasma treatment apparatus, and a plasma-treated long object can be obtained by the method.