This inventor holds 1 USPTO granted patent. Top assignee: Fujibo Holdings, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Keisuke Tanaka: Inventor of a Polishing Pad Design
Introduction
Keisuke Tanaka is an inventor associated with Saijo, Japan, and Fujibo Holdings, Inc. His patent work addresses polishing-pad design and manufacturing.
Latest Patents
Tanaka is associated with 1 patent: “Polishing Pad and Method for Manufacturing Polishing Pad.” The invention describes a polishing pad designed to reduce variations in light transmittance or limit the adhesion and sticking of polishing swarf to the polishing-surface side of the light-transmitting resin window member.
Career Highlights
Tanaka’s listed patent reflects work on polishing-pad performance and manufacturing, with attention to the optical properties of the window member and the accumulation of polishing debris.
Collaborations
His listed coworkers include Teppei Tateno and Yoshie Kiraku. The available information identifies these colleagues but does not specify the details of their collaboration.
Conclusion
Keisuke Tanaka’s patent focuses on improving polishing-pad design by addressing light-transmittance variation and polishing-swarf adhesion.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile