The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Sep. 16, 2021
Applicant:
Fujibo Holdings, Inc., Tokyo, JP;
Inventors:
Teppei Tateno, Saijo, JP;
Keisuke Tanaka, Saijo, JP;
Yoshie Kiraku, Saijo, JP;
Kenichi Koike, Saijo, JP;
Hiroshi Kurihara, Saijo, JP;
Yoshiki Miyauchi, Saijo, JP;
Assignee:
FUJIBO HOLDINGS, INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/24 (2012.01); B24B 37/26 (2012.01); B24D 3/22 (2006.01); C08J 7/056 (2020.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); B24B 37/26 (2013.01); B24D 3/22 (2013.01); C08J 7/056 (2020.01);
Abstract
The present invention provides a polishing pad that can suppress variations in light transmittance or a polishing pad that can reduce adhesion and sticking of polishing swarf to the surface on the polishing surface side of the light-transmitting resin member (window member).
Tateno, Teppei. (2026). Polishing pad and method for manufacturing polishing pad (U.S. Patent No. 12722247). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12722247
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile