Yamanashi, Japan

Keiji Tabuki

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keiji Tabuki. Retrieved from https://idiyas.com/inventor/keiji-tabuki-9mv77cu2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Keiji Tabuki: A Pioneer in Silicon Nitride Deposition Methods

Introduction: Keiji Tabuki is an accomplished inventor hailing from Yamanashi, Japan, renowned for his contributions to the field of semiconductor manufacturing. With a focus on advanced deposition methods, Tabuki has made significant strides in enhancing the efficiency and quality of silicon nitride film applications. His innovative techniques have broad implications for technology and industry, particularly in the realm of electronics.

Latest Patents: Tabuki holds a patent for a novel deposition method that involves depositing a silicon nitride film on the surface of a substrate. This method utilizes the intermittent supply of trisilylamine in a processing chamber, allowing for precise control over the film deposition process. The patent showcases his expertise and commitment to advancing semiconductor fabrication technologies, making notable improvements in the industry.

Career Highlights: Keiji Tabuki has dedicated his career to semiconductor research and development, working at Tokyo Electron Limited, a leading company in the field. His work has been instrumental in pushing the boundaries of semiconductor technology, ensuring the production of high-quality components for electronic devices worldwide. With one patent to his name, he exemplifies the innovation spirit that drives the tech industry forward.

Collaborations: Throughout his career, Tabuki has worked closely with esteemed colleagues, including Ken Okoshi, highlighting a collaborative approach to innovation in semiconductor technology. Their combined expertise and insights contribute significantly to the development of cutting-edge technologies that benefit the broader scientific community.

Conclusion: Keiji Tabuki's contributions to the field of semiconductor manufacturing, particularly with his patented deposition method for silicon nitride films, exemplify the vital role of inventors in advancing technology. His work at Tokyo Electron Limited and collaborations with professionals like Ken Okoshi reflect the spirit of innovation that continues to shape the future of electronics and manufacturing. The impacts of his inventions will undoubtedly resonate in the industry for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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