Tokyo, Japan

Keiji Shiotani

This inventor holds 2 USPTO granted patents. Top assignee: Nec Corporation. Active years: 1996-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keiji Shiotani. Retrieved from https://idiyas.com/inventor/keiji-shiotani-t47v24df

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 1996-1999

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2 patents (USPTO):Explore Patents

Title: Keiji Shiotani: Innovator in Capacitor Technology

Introduction

Keiji Shiotani is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for forming capacitor electrodes. With a total of 2 patents to his name, Shiotani's work has advanced the efficiency and functionality of electronic components.

Latest Patents

Shiotani's latest patents include a "Method for forming capacitor electrode having jagged surface" and a "Method of forming silicon film having jagged surface." In the first patent, he describes a process where an amorphous silicon film is prepared on a substrate, followed by the formation of a mask layer. This mask layer is used to dry-etch the silicon film, resulting in a jagged surface with numerous protrusions. This innovative surface is then transformed into a polycrystalline silicon film that serves as a storage electrode, onto which a dielectric film and another storage electrode are sequentially formed. The second patent outlines a method where a metal layer is deposited on a silicon film to create a silicide layer. After etching away the metal layer, silicide islands remain, which serve as a selective mask for dry-etching the exposed silicon film surface.

Career Highlights

Keiji Shiotani is currently employed at NEC Corporation, a leading technology company in Japan. His work at NEC has allowed him to focus on cutting-edge research and development in semiconductor technologies. His innovative approaches have contributed to the advancement of capacitor technology, making significant impacts in the electronics industry.

Collaborations

Shiotani has collaborated with notable colleagues, including Tatsuya Suzuki and Hideo Kawano. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Keiji Shiotani's contributions to capacitor technology through his innovative patents and collaborations highlight his role as a key figure in the semiconductor industry. His work continues to influence advancements in electronic components, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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