Chiba, Japan

Keiichi Terashima

This inventor holds 1 USPTO granted patent. Top assignee: Youtec Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keiichi Terashima. Retrieved from https://idiyas.com/inventor/keiichi-terashima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Keiichi Terashima: Innovator in High-Density CNH Film Technology

Introduction

Keiichi Terashima is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of materials science, particularly in the development of high-density films. His innovative work has led to the creation of a unique patent that addresses specific challenges in film deposition methods.

Latest Patents

Keiichi Terashima holds 1 patent for his invention titled "To provide a CNH film of high density and a deposition method." This patent focuses on a CNH film formed on a substrate to be deposited, showcasing his expertise in advanced material applications.

Career Highlights

Throughout his career, Terashima has been associated with Youtec Co., Ltd., where he has played a pivotal role in research and development. His work has not only advanced the company's technological capabilities but has also contributed to the broader field of material sciences.

Collaborations

In his professional journey, Keiichi has collaborated with talented individuals such as Yuuji Honda and Kouji Abe. These collaborations have fostered an environment of innovation and creativity, leading to the successful development of new technologies.

Conclusion

Keiichi Terashima's contributions to high-density film technology exemplify the impact of dedicated inventors in advancing material sciences. His innovative spirit and collaborative efforts continue to inspire future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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