This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Mitsubishi Hitachi Power Systems, Ltd.. Active years: 2015.
Company Filing History:
Years Active: 2015
Title: Keiichi Kenmotsu: Innovator in Film Thickness Measurement Technology
Introduction
Keiichi Kenmotsu is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of measurement technology, particularly in the area of film thickness measurement for thermal barrier coatings on turbine blades. His innovative approach has led to the development of a specialized apparatus that enhances the accuracy and efficiency of this critical measurement process.
Latest Patents
Kenmotsu holds a patent for a "Film thickness measurement apparatus and film thickness measurement method." This invention includes an ECT sensor designed to measure the film thickness of thermal barrier coatings on turbine blades. The apparatus features a storage unit for storing measurement points, a laser displacement meter for assessing the shape of the turbine blade, and a measurement position calculation unit that determines the optimal measurement point. Additionally, an arm drive unit adjusts the ECT sensor's position based on the calculated measurement point, ensuring precise film thickness measurements.
Career Highlights
Kenmotsu is currently employed at Mitsubishi Hitachi Power Systems, Ltd., where he applies his expertise in measurement technology. His work has been instrumental in advancing the capabilities of turbine blade manufacturing and maintenance. With a focus on innovation, he continues to contribute to the development of cutting-edge technologies in the energy sector.
Collaborations
Kenmotsu has collaborated with esteemed colleagues such as Masaaki Kurokawa and Shigetoshi Shiotani. Their combined efforts have fostered a collaborative environment that encourages the exchange of ideas and the pursuit of innovative solutions in their field.
Conclusion
Keiichi Kenmotsu is a distinguished inventor whose work in film thickness measurement technology has made a significant impact on the industry. His innovative patent and contributions to Mitsubishi Hitachi Power Systems, Ltd. highlight his commitment to advancing measurement techniques in energy applications.