This inventor holds 1 USPTO granted patent. Top assignee: Mitsui Chemicals, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Keiichi Kakihara: Innovator in Pellicle Technology
Introduction
Keiichi Kakihara is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of pellicle technology, which is essential in the semiconductor manufacturing process. His innovative work has led to the development of a unique patent that addresses critical challenges in the industry.
Latest Patents
Kakihara holds a patent for a pellicle, exposure master, exposure device, pellicle production method, and test method for the mask adhesive layer. This invention provides a pellicle that includes a frame on which a pellicle film is placed, along with a mask adhesive layer positioned on the frame. The patent details a process where the attachment portion of the adhesive layer to a quartz mask is irradiated with xenon (Xe) excimer lamp light from the back surface of the mask for two minutes. Following this, when the pellicle is peeled off, the residual ratio of the adhesive layer on the quartz mask is maintained between 0.001 to 5.0%. This innovation is crucial for enhancing the efficiency and effectiveness of semiconductor manufacturing.
Career Highlights
Keiichi Kakihara is currently employed at Mitsui Chemicals, Inc., where he continues to push the boundaries of innovation in his field. His work has not only contributed to the advancement of pellicle technology but has also positioned him as a key player in the semiconductor industry.
Collaborations
Kakihara has collaborated with notable colleagues, including Yutaka Yoshimura and Ryo Tanaka. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Keiichi Kakihara's contributions to pellicle technology exemplify the importance of innovation in the semiconductor industry. His patent and ongoing work at Mitsui Chemicals, Inc. highlight his role as a leading inventor in this critical field.