The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

Jan. 26, 2023
Applicant:

Mitsui Chemicals, Inc., Tokyo, JP;

Inventors:

Yutaka Yoshimura, Tokyo, JP;

Keiichi Kakihara, Tokyo, JP;

Ryo Tanaka, Tokyo, JP;

Yuji Maruyama, Tokyo, JP;

Masatsugu Higashi, Tokyo, JP;

Masakazu Yamauchi, Tokyo, JP;

Tomokazu Tanaka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/62 (2012.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 1/62 (2013.01); G03F 7/70983 (2013.01);
Abstract

Provided is a pellicle, including a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein when an attachment portion Sof the adhesive layer to a quartz mask is irradiated with xenon (Xe) excimer lamp light from a back surface of the mask for 2 minutes and the pellicle is then peeled off, a residual ratio (residual area of the adhesive layer on a quartz mask/area of the attachment portion Sof the adhesive layer) of the adhesive layer is 0.001 to 5.0%.


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