This inventor holds 1 USPTO granted patent. Top assignee: Nikko Materials Company, Limited. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Keiichi Ishizuka and Sputtering Target Innovation.
Introduction
Keiichi Ishizuka is an inventor associated with Ibaraki, Japan, and Nikko Materials Company, Limited. His patent work addresses cracking in sputtering targets, particularly during manufacturing and sputtering.
Latest Patents
Ishizuka is associated with 1 patent, titled “Sputtering target.” The invention specifies how the grinding direction on a target’s surface should relate to its warping direction after the target is bonded to a backing plate. For rectangular targets, it also describes a relationship between the grinding direction, the warping direction, and the target’s diagonal.
The design aims to reduce or prevent cracking caused by differences in thermal expansion coefficients. It is especially relevant to ceramic target manufacturing, including the process of bonding a target to its backing plate, and seeks to limit similar cracking during sputtering.
Career Highlights
Ishizuka’s documented patent contribution focuses on improving the durability of sputtering targets through manufacturing design. The patent connects surface-grinding orientation with the stresses that can arise during bonding and use.
Collaborations
Ishizuka is associated with Nikko Materials Company, Limited. Yoshikazu Kumahara is identified as a coworker.
Conclusion
Keiichi Ishizuka’s sputtering-target patent presents a practical approach to reducing cracking by coordinating grinding direction with target warping and geometry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile