Keiichi Ishimoto

Title: Keiichi Ishimoto: Innovator in Silicon Crystal Technology

Introduction

Keiichi Ishimoto is a notable inventor based in Kochi, Japan. He is recognized for his contributions to the field of silicon crystal technology, particularly through his innovative patent that enhances the production of acicular silicon crystals.

Latest Patents

Ishimoto holds a patent for an "Acicular silicon crystal and process for producing the same." This invention involves the uniform formation of microscopic acicular crystals on a silicon substrate using a plasma CVD method with a catalyst. The process allows for the reliable and homogeneous production of ultramicroscopic acicular silicon crystals that have a cone shape with a radius of curvature ranging from 1 nm to 20 nm at the tip. The bottom surface diameter is not less than 10 nm, and the height is equivalent to or greater than the diameter of the bottom surface.

Career Highlights

Throughout his career, Keiichi Ishimoto has worked with several companies, including Covalent Materials Corporation and Techno Network Shikoku Co., Ltd. His work has significantly impacted the development of advanced materials in the semiconductor industry.

Collaborations

Ishimoto has collaborated with notable colleagues such as Akitmitsu Hatta and Hiroaki Yoshimura. Their combined expertise has contributed to the advancement of silicon crystal technology.

Conclusion

Keiichi Ishimoto's innovative work in the field of silicon crystals showcases his dedication to advancing technology. His patent and collaborations highlight his significant contributions to the industry.