Company Filing History:
Years Active: 2006-2008
Title: Kei Mesuda: Innovator in Phase Shift Mask Design
Introduction
Kei Mesuda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of optical design, particularly in the development of phase shift masks. With a total of 3 patents to his name, Mesuda's work has been instrumental in advancing technologies that enhance the efficiency of optical systems.
Latest Patents
One of Mesuda's latest patents focuses on a designing method and device for phase shift masks. This innovation aims to lighten the workload associated with designing trench-type, Levenson-type phase shift masks. The process involves creating a pattern with multiple apertures using a specialized designing tool. Optimal functions are prepared in a database to indicate the best combinations of undercut amounts and bias correction amounts based on specific dimension conditions. The invention includes tools for extracting optimal functions and determining the necessary values for undercut and bias correction. Additionally, a three-dimensional structure determination tool is utilized to create a structural body that shifts the phase of transmitted light by 180 degrees. This method significantly reduces the time required for the designing process.
Career Highlights
Kei Mesuda is currently employed at Dai Nippon Printing Co., Ltd., where he continues to innovate in the field of optical design. His work has not only contributed to the company's advancements but has also set new standards in the industry.
Collaborations
Mesuda collaborates with notable colleagues, including Nobuhito Toyama and Yasutaka Morikawa. Their combined expertise fosters a creative environment that drives innovation in their projects.
Conclusion
Kei Mesuda's contributions to the field of phase shift mask design exemplify his commitment to innovation and efficiency. His patents reflect a deep understanding of optical systems and a dedication to improving design processes.