The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Feb. 25, 2003
Kei Mesuda, Tokyo, JP;
Nobuhito Toyama, Tokyo, JP;
Kei Mesuda, Tokyo, JP;
Nobuhito Toyama, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
The work load spent on designing a trench-type, Levenson-type phase shift mask is lightened and the working time for the designing process is shortened. A pattern, having a plurality of apertures, is designed by means of a designing tool. In a databaseare prepared optimal functions that indicate optimal combinations of undercut amounts Uc and bias correction amounts δ according to each set of dimension conditions. An optimal function extraction toolextracts optimal functions Fp and Fs that are matched with dimension conditions Mp and Ms on pattern 11, and determining tooldetermines optimal values of the undercut amount Uc and the bias correction amount δ based on the extracted optimal function. A three-dimensional structure determining tooldetermines a three-dimensional structural body, having a depth d and the undercut amount Uc, for an aperture by which the phase of transmitted light is shifted by 180 degrees. Pattern correction tooluses the bias correction amount δ to perform correction of the width of an aperture on patternand thereby provides a corrected pattern