Location History:
- Round Rock, TX (US) (2002 - 2004)
- Arlington, TX (US) (2012)
Company Filing History:
Years Active: 2002-2012
Title: Innovations by Inventor Kefeng Liu
Introduction
Kefeng Liu is a notable inventor based in Round Rock, TX (US), recognized for his contributions to electromagnetic compatibility and absorber technologies. He holds a total of 4 patents, showcasing his innovative approach to solving complex engineering challenges.
Latest Patents
One of his latest patents is focused on the "Termination of edges of a parabolic reflector in a compact range." This invention includes an anechoic chamber lined with absorbers to absorb electromagnetic energy at the interfaces of the absorber and reflector edges. The design features a reflector that reflects waves from a source, creating a substantially plane wave field within the test zone of the chamber. In some embodiments, the reflector's outer periphery extends to the chamber's interior walls, floor, and ceiling, and is embedded in the absorber.
Another significant patent is the "Matching network hybrid electro-magnetic compatibility absorber." This invention involves a substrate made from various materials that serves as a frame for partial coatings. The design parameters of the substrate and coatings control the electrical properties of the absorber. By utilizing partial and full coatings, the physical shape and mechanical properties can be decoupled from the electrical properties. This innovation allows designers to modify and control the electrical performance of an electromagnetic test system effectively.
Career Highlights
Kefeng Liu has worked with prominent companies in the field, including EMC Test Systems, L.P. and ETS-Lindgren, Inc. His experience in these organizations has contributed to his expertise in electromagnetic compatibility and absorber technologies.
Collaborations
Throughout his career, Liu has collaborated with notable professionals such as Bryan Howard Sayler and Michael David Foegelle. These collaborations have further enriched his work and innovations in the field.
Conclusion
Kefeng Liu's contributions to the field of electromagnetic compatibility and absorber technologies are significant, as evidenced by his patents and collaborations. His innovative solutions continue to impact the industry positively.