Keeho Kim

Title: Keeho Kim: Innovator in Semiconductor Technology

Introduction

Keeho Kim is a prominent inventor based in McKinney, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in photolithography processes. His innovative approach has led to advancements that enhance the precision and efficiency of semiconductor manufacturing.

Latest Patents

Keeho Kim holds a patent for a semiconductor process using delay-compensated exposure. This method provides critical dimension (CD) gate control during photolithography by scanning a trial wafer from a batch with an exposure tool. The gate width is measured to determine shot zones for bi-shot (BSE) exposure. The time delay based on shot or exposure order is determined for each BSE zone. Subsequently, the shot or exposure dose for other wafers from the same or similar batch is established based on the bi-shot exposure and the shot order.

Career Highlights

Keeho Kim is associated with Texas Instruments Corporation, a leading company in the semiconductor industry. His work has been instrumental in developing processes that improve the manufacturing of semiconductor devices. His expertise in photolithography has positioned him as a valuable asset in the field.

Collaborations

Keeho Kim has collaborated with notable colleagues, including Jarvis Benjamin Jacobs and Reima Tapani Laaksonen. These collaborations have fostered an environment of innovation and have contributed to the advancement of semiconductor technologies.

Conclusion

Keeho Kim's contributions to semiconductor technology through his innovative patent and work at Texas Instruments Corporation highlight his role as a key inventor in the industry. His advancements in photolithography processes continue to influence the field positively.