This inventor holds 11 USPTO granted patents and 3 published patent applications. Top assignee: Lam Research Corporation. Active years: 2012-2025.
Location History:
- Dublin, CA (US) (2012)
- Pleasanton, CA (US) (2012 - 2020)
Company Filing History:
Years Active: 2012-2025
Title: Keechan Kim: Innovator in Substrate Processing Technology
Introduction
Keechan Kim is a prominent inventor based in Pleasanton, CA (US). He has made significant contributions to the field of substrate processing technology, holding a total of 11 patents. His work focuses on enhancing the efficiency and effectiveness of plasma treatment processes.
Latest Patents
Among his latest innovations is the "Lower plasma exclusion zone ring for bevel etcher." This substrate processing system is designed to optimize plasma treatment of the bevel edge of a substrate. It features an upper plasma exclusion zone ring positioned above the substrate during treatment, along with a lower plasma exclusion zone ring located below the substrate. The design includes an annular body with a lower portion that is partially arranged below the substrate, and an upwardly projecting flange that extends upwardly from the lower portion. This innovative structure ensures that the uppermost surface of the flange aligns with either the middle portion of the substrate or above it.
Another notable patent is the "Lower plasma-exclusion-zone rings for a bevel etcher." This invention provides a ring-shaped body with a radially-outer stepped surface, specifically designed to etch the bevel edge of a substrate. The materials used for the ring-shaped body include aluminum oxide, aluminum nitride, silicon, silicon carbide, silicon nitride, and yttria, showcasing a range of options for optimal performance.
Career Highlights
Keechan Kim is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role involves developing advanced technologies that improve substrate processing methods, contributing to the company's reputation for innovation and excellence.
Collaborations
Throughout his career, Keechan has collaborated with talented individuals such as Yunsang Kim and George Stojakovic. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Keechan Kim's contributions to substrate processing technology are noteworthy, with a focus on enhancing plasma treatment processes. His innovative patents and collaborations reflect his commitment to advancing the field.