Kee-sang Kwon

Title: Innovations of Kee-sang Kwon

Introduction

Kee-sang Kwon is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work primarily focuses on integrated circuit devices and FinFET semiconductor devices.

Latest Patents

One of Kee-sang Kwon's latest patents is for an integrated circuit device. This device includes an insulating film on a substrate, a lower wiring layer that penetrates the insulating film, and a lower conductive barrier film. The lower wiring layer consists of a first metal, while the lower conductive barrier film includes a second metal that is different from the first. Additionally, the device features a first metal silicide capping layer and a second metal silicide capping layer, enhancing its functionality.

Another significant patent is for a FinFET semiconductor device and the method of manufacturing it. This semiconductor device includes a substrate with a fin-type active region and a gate insulating layer that covers the active region. The gate line, which has a relatively narrow width and smaller pitch, intersects the fin-type active region, providing improved performance characteristics.

Career Highlights

Kee-sang Kwon is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to cutting-edge innovations in semiconductor technology.

Collaborations

Throughout his career, Kee-sang Kwon has collaborated with talented individuals such as Jae-Jik Baek and Sang-Jine Park. These collaborations have further enhanced the quality and impact of his inventions.

Conclusion

Kee-sang Kwon's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as an influential inventor in the industry. His innovative designs continue to shape the future of integrated circuits and semiconductor devices.