Guangdong, China

Ke Shi

This inventor holds 1 USPTO granted patent. Top assignee: Sun Yat-Senuniversity. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ke Shi. Retrieved from https://idiyas.com/inventor/ke-shi-qrjehllg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ke Shi

Introduction

Ke Shi is a notable inventor based in Guangdong, China. He has made significant contributions to the field of image processing, particularly in the development of methods for determining seam lines in orthoimages. His work is essential for enhancing the quality and accuracy of image mosaicking.

Latest Patents

Ke Shi holds a patent for a "Method for determining seam line of orthoimages, method for generating mosaic image of orthoimages, device thereof, and medium thereof." This innovative method involves extracting valid area contours from both master and slave images using a crawling search method. It calculates difference values of valid pixels within overlapping areas to create a difference map. The process includes determining a seam line through an A* algorithm, optimizing the intersection points for improved image quality.

Career Highlights

Ke Shi is affiliated with Sun Yat-sen University, where he continues to advance his research in image processing technologies. His work has garnered attention for its practical applications in various fields, including remote sensing and geographic information systems.

Collaborations

Ke Shi collaborates with esteemed colleagues such as Qingsong Wang and Haisong Weng. Their combined expertise contributes to the advancement of innovative solutions in their respective fields.

Conclusion

Ke Shi's contributions to the field of image processing through his patented methods demonstrate his commitment to innovation and excellence. His work not only enhances the quality of orthoimages but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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