The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Nov. 11, 2024
Sun Yat-sen University, Guangdong, CN;
Qingsong Wang, Guangdong, CN;
Haisong Weng, Guangdong, CN;
Ke Shi, Guangdong, CN;
Tao Lai, Guangdong, CN;
Haifeng Huang, Guangdong, CN;
SUN YAT-SEN UNIVERSITY, Guangzhou, CN;
Abstract
A method for determining a seam line of orthoimages, method for generating a mosaic image, device, and medium. The method includes: extracting valid area contours of a master image and a slave image respectively through a crawling search method; calculating difference values of valid pixels within an overlapping area between the master and slave images through a difference function, to obtain a difference map of the valid area; if there are more than two intersection points: calculating a position of a centroid of the overlapping area based on coordinates of each contour point of the intersection contour, determining a rectangular window centered on the centroid in the difference map, searching the rectangular window, and taking a position with a smallest difference value as an optimization end and the intersection points as optimization starts; determining, based on the optimization start and optimization end, a seam line through an A* algorithm.