Location History:
- Tosu, JP (2002)
- Koshi, JP (2012)
Company Filing History:
Years Active: 2002-2012
Title: Kazuyuki Honda: Innovator in Substrate Processing Technology
Introduction
Kazuyuki Honda is a notable inventor based in Tosu, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of substrate processing methods, particularly in the semiconductor industry.
Latest Patents
One of his latest patents is a substrate processing apparatus and substrate processing method. This invention allows for the processing of a substrate using a supercritical fluid without exposing the pattern formed on the substrate to an atmospheric environment. The apparatus includes a cleaning bath designed to accommodate a substrate and clean it by flowing a cleaning solution, along with a processing vessel that processes the substrate with a supercritical fluid.
Another significant patent is a cleaning and drying method and apparatus for objects to be processed. This apparatus features a cleaning bath for collecting and discharging cleaning liquid, a drying chamber positioned above the cleaning bath, and a wafer boat for transferring semiconductor wafers between the two. The design includes dry gas nozzles for ejecting dry gas in the drying chamber, enhancing the drying efficiency while reducing the consumption of dry gas.
Career Highlights
Kazuyuki Honda is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work has positioned him as a key figure in advancing substrate processing technologies.
Collaborations
Throughout his career, Honda has collaborated with notable coworkers, including Katuki Yamasaki and Osamu Kuroda. These collaborations have contributed to the development of cutting-edge technologies in the field.
Conclusion
Kazuyuki Honda's contributions to substrate processing technology demonstrate his commitment to innovation and efficiency in the semiconductor industry. His patents reflect a deep understanding of the challenges in substrate processing and offer practical solutions that enhance operational effectiveness.