Tokyo, Japan

Kazuyuki Hirozane

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.6

ph-index = 4

Forward Citations = 58(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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6 patents (USPTO):Explore Patents

Title: Kazuyuki Hirozane: Innovator in Gas Supply and Plasma Processing Technologies

Introduction

Kazuyuki Hirozane is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of gas supply apparatus and plasma processing technologies. With a total of 6 patents to his name, Hirozane has demonstrated a commitment to innovation and problem-solving in his work.

Latest Patents

Hirozane's latest patents include a gas supply apparatus and a plasma processing apparatus. The gas supply apparatus is designed to effectively suppress backflow of process gas during operations within a processing chamber. It features ports connected to various gas sources, allowing for the efficient supply of both purging and processing gases. The apparatus includes a collective pipe where these gases are joined and flowed, ensuring optimal performance.

The plasma processing apparatus aims to inhibit gas clustering and ensure stable gas supply. It incorporates an integrated gas box that adjusts gas flow rates and includes a heater to maintain the gas at a predetermined temperature, enhancing the efficiency of the processing operations.

Career Highlights

Hirozane has worked with notable companies such as Hitachi High-Tech Corporation and Hitachi High-Technologies Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the industry.

Collaborations

Throughout his career, Hirozane has collaborated with esteemed colleagues, including Yutaka Kouzuma and Michiaki Kobayashi. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Kazuyuki Hirozane is a distinguished inventor whose work in gas supply and plasma processing technologies has made a significant impact in his field. His innovative patents and collaborations reflect his dedication to advancing technology and solving complex challenges.

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