Hitachi High-tech Corporation

Hitachi-high-technologies Corporation

Kazuyuki Hirozane

Yutaka Kouzuma

Michiaki Kobayashi

Hiroyuki Kobayashi

Kohei Kawamura

Nobuya Miyoshi

Yoshifumi Ogawa

Yoshinori Yoshida

Yasushi Sonoda

Nobuhide Nunomura

Keisuke Akinaga

Akio Harada

There is provided a gas supply apparatus that can effectively suppress a trouble caused by backflow of a process gas to the upstream side when processing is performed by using the process gas inside a chamber. The gas supply apparatus supplies gas to a processing chamber in which a sample is processed. The gas supply apparatus includes: ports respectively connected to gas sources of a plurality of types of gases containing a purging gas and a processing gas; and a collective pipe in which the plurality of types of gases supplied from the ports are joined and flowed. A gas flow path through which gas supplied from the port connected to the gas source for the purging gas flows is formed on an uppermost stream side of the collective pipe.

Gas supply apparatus, vacuum processing apparatus, and gas supply method

A plasma processing apparatus that can inhibit clustering of gas and supply the gas stably, including an integrated gas box configured to adjust the flow rate of gas, and a discharge portion, and the integrated gas box includes gas blocks including a flow path through which the gas flows, a heater configured to heat the flow path, a bypass path provided in the flow path, and a flow controller configured to detect the inflow amount of the gas and output the gas from the flow path to the discharge portion. The heater is configured to perform heating to a predetermined temperature based on the type of the gas. The predetermined temperature is, for example, 65° C. or more. The bypass path includes a flow path causing a change in the pressure of the gas flowing through the flow path.

Plasma processing apparatus

Ion shield plate base for semiconductor manufacturing apparatus

Integrated type ion shield for semiconductor manufacturing apparatus

Ion shield plate for semiconductor manufacturing apparatus

Infrared lamp heater transmission window for semiconductor manufacturing apparatus

Growing community of inventors

Tokyo, Japan

Kazuyuki Hirozane