Tokyo, Japan

Kazuya Hiramoto

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Ebara Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuya Hiramoto. Retrieved from https://idiyas.com/inventor/kazuya-hiramoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Kazuya Hiramoto: Innovator in Pump Technology

Introduction

Kazuya Hiramoto is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of pump technology, particularly through his innovative designs and patents. His work is recognized for its practical applications and advancements in engineering.

Latest Patents

Hiramoto holds a patent for a pump casing and a pump. The patent describes a pump casing that includes a cutter with an upper surface facing the leading edge portion of an impeller when the impeller is housed in the pump casing. This upper surface features a region with at least two angles, enhancing the efficiency and functionality of the pump.

Career Highlights

Kazuya Hiramoto is associated with Ebara Corporation, a leading company in the field of fluid machinery and systems. His role at Ebara has allowed him to work on various innovative projects that contribute to the company's reputation for excellence in engineering.

Collaborations

Hiramoto collaborates with talented individuals such as Miho Isono and Shrunali Ranade. Their teamwork fosters an environment of creativity and innovation, leading to advancements in pump technology.

Conclusion

Kazuya Hiramoto's contributions to pump technology through his patent and work at Ebara Corporation highlight his role as an influential inventor. His innovative designs continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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