Osaka, Japan

Kazuto Hasegawa


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Kazuto Hasegawa: Innovator in Endpoint Detection Technology

Introduction

Kazuto Hasegawa is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of technology, particularly in the area of endpoint detection processes. His innovative work has led to the development of a patented method that enhances the efficiency of various processes in the semiconductor industry.

Latest Patents

Hasegawa holds a patent for a "Method of detecting end point of process, end point detector, computer memory product and chemical mechanical polishing apparatus." This invention provides a method for detecting an endpoint by measuring a physical quantity that changes according to the progress of a process. The method involves extracting first and second time series data, with the second data set delayed by a predetermined time. The correlation between these data sets allows for the detection of the endpoint in a shorter period without the need for multiple preliminary tests. This innovation is crucial for improving the efficiency of manufacturing processes.

Career Highlights

Kazuto Hasegawa is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work at the company has been instrumental in advancing technologies that are vital for modern manufacturing. Hasegawa's expertise and innovative mindset have positioned him as a key figure in his field.

Collaborations

Hasegawa has collaborated with notable colleagues such as Takaya Miyano and Kiyoshi Miura. These partnerships have fostered an environment of innovation and have contributed to the successful development of new technologies.

Conclusion

Kazuto Hasegawa's contributions to endpoint detection technology exemplify the impact of innovation in the semiconductor industry. His patented methods not only enhance process efficiency but also pave the way for future advancements in technology.

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