The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2001

Filed:

Sep. 25, 1998
Applicant:
Inventors:

Takaya Miyano, Osaka, JP;

Kiyoshi Miura, Osaka, JP;

Kazuto Hasegawa, Osaka, JP;

Yasuo Shirai, Osaka, JP;

Assignee:

Tokyo Electron Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 1/500 ;
U.S. Cl.
CPC ...
G01R 1/500 ;
Abstract

The invention provides a method of detecting an end point, an end point detector, a computer memory product and a chemical mechanical polishing apparatus, in which a physical quantity changing in accordance with proceeding of a process is measured, first time series data and second time series data delayed by a predetermined time from the first time series data are extracted on the basis of the measured Physical quantity, and the end point of the process is detected on the basis of correlation between the first time series data and the second time series data. Thus, the end point can be detected in a shorter period of time without previously performing plural tests.


Find Patent Forward Citations

Miyano, Takaya. (2001). Method of detecting end point of process, end point detector, computer memory product and chemical mechanical polishing apparatus (U.S. Patent No. 6327540). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6327540

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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