Tokyo, Japan

Kazushige Matsuno

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazushige Matsuno. Retrieved from https://idiyas.com/inventor/kazushige-matsuno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Kazushige Matsuno: Innovator in Flow Rate Control Technology

Introduction

Kazushige Matsuno is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to the field of flow rate control technology. His work has significantly impacted various applications involving gas flow management.

Latest Patents

Matsuno holds a patent for a "Flow Rate Controller and Processing Apparatus." This invention is designed to control the flow rate of gas supplied through a gas passage. The flow rate controller includes a main gas pipe, a flow rate detecting unit, a flow rate control valve mechanism, a conversion data storage unit, and a flow rate control main body. The system effectively manages the flow rate based on external signals and the specific gaseous species involved.

Career Highlights

Kazushige Matsuno is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His role at the company has allowed him to develop and refine his innovative ideas in flow rate control technology.

Collaborations

Matsuno has worked alongside notable colleagues such as Tsuneyuki Okabe and Shuji Moriya. Their collaborative efforts have contributed to advancements in their respective fields.

Conclusion

Kazushige Matsuno's work in flow rate control technology exemplifies the spirit of innovation. His contributions continue to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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