Kawasaki, Japan

Kazushi Ishida


Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 46(Granted Patents)


Location History:

  • Kawasaki, JP (1996 - 2000)
  • Tokyo, JP (1989 - 2003)

Company Filing History:


Years Active: 1989-2003

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8 patents (USPTO):Explore Patents

Title: **Kazushi Ishida: Innovator in Particle Beam Technology and Cleaning Methods**

Introduction

Kazushi Ishida is a prominent inventor based in Kawasaki, Japan, known for his contributions to innovative methods in the semiconductor and optics fields. With a portfolio of 8 patents, Ishida has developed cutting-edge technologies that enhance the efficiency and precision of manufacturing processes.

Latest Patents

Among his latest achievements is a patent for a "Method of Removing Particles from Stage and Cleaning Plate." This method simplifies the removal of particles from a stage that holds planar workpieces, such as semiconductor wafers and glass substrates. The process involves using a resin film that collects particles from the stage and can be reused after being peeled off and recoated. Another key patent is the "Method and System for Charged Particle Beam Exposure." This invention outlines a sophisticated scanning stage that accommodates multiple wafers while accurately correcting deviations in position during exposure, ensuring high fidelity in semiconductor manufacturing.

Career Highlights

Kazushi Ishida has worked with reputable companies in the tech industry, including Fujitsu Corporation and Advantest Corporation. His expertise in particle beam technology and cleaning methods has positioned him as a valuable asset in these organizations, driving advancements in semiconductor production and equipment reliability.

Collaborations

Throughout his career, Ishida has collaborated with notable colleagues such as Yoshihisa Ooae and Hiroshi Yasuda. These partnerships have contributed to his innovative approaches and the successful development of his patented technologies.

Conclusion

Kazushi Ishida's work embodies the spirit of innovation in the fields of semiconductor engineering and manufacturing technology. His advancements in particle cleaning and beam exposure systems continue to influence the industry, highlighting his status as a visionary inventor dedicated to enhancing production efficiency and accuracy in high-tech applications.

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