Tsuruoka, Japan

Kazunori Ueno

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazunori Ueno. Retrieved from https://idiyas.com/inventor/kazunori-ueno-nlisyw40

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kazunori Ueno and His Inertial Sensor Patent.

Introduction

Kazunori Ueno is an inventor associated with Tsuruoka, Japan, and Seiko Epson Corporation. His patent work includes an invention focused on the structure and manufacture of an inertial sensor.

Latest Patents

Ueno is credited with 1 patent: “Inertial Sensor, Method of Manufacturing Inertial Sensor, and Inertial Measurement Unit.” The patent describes a sensor built on a substrate with an insulating film and two semiconductor layers. Oxide films are placed along facing sides of the semiconductor layers, with a planarization insulating film between and above them. Wiring on the planarization film electrically connects to the second semiconductor layer. The disclosed structure relates to inertial sensing and its integration into an inertial measurement unit.

Career Highlights

Ueno’s listed patent is associated with Seiko Epson Corporation, a company whose work includes precision technologies and electronic devices. The invention’s focus on sensor structure and manufacturing reflects an engineering contribution to inertial measurement technology.

Collaborations

Teruo Takizawa and Taiki Goto are identified as Ueno’s coworkers. Their names provide context for the professional environment associated with his patent work.

Conclusion

Kazunori Ueno’s patent documents a specific approach to constructing and manufacturing an inertial sensor, connecting his inventive work with Seiko Epson Corporation and the field of inertial measurement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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