Shizuoka, Japan

Kazunori Kurosawa

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Kakegawa, JP (2011)
  • Shizuoka, JP (2014)

Company Filing History:


Years Active: 2011-2014

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2 patents (USPTO):

Title: Kazunori Kurosawa: Innovator in Superfine Pattern Technology

Introduction

Kazunori Kurosawa is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of superfine pattern technology, holding a total of 2 patents. His work focuses on innovative methods for producing superfine patterns, which are essential in various high-tech applications.

Latest Patents

Kurosawa's latest patents include a "Superfine Pattern Mask, Method for Production Thereof, and Method Employing the Same for Forming Superfine Pattern." This invention provides a composition that simplifies the production of superfine patterns with high mass productivity. The composition consists of perhydropolysilazane, a silicon-containing polymer with a hydrocarbon group, and a solvent. The mixture is designed to achieve an optimal ratio of silicon-hydrogen bonds to silicon-hydrocarbon group bonds, facilitating the formation of spacers on resist patterns.

Another significant patent is the "Hardmask Process for Forming a Reverse Tone Image Using Polysilazane." This process involves several steps, including forming an optional absorbing organic underlayer, applying a photoresist, and etching to reveal the photoresist pattern. The end result is a microelectronic device that utilizes this innovative process.

Career Highlights

Kurosawa is currently employed at Az Electronic Materials USA Corp., where he continues to develop cutting-edge technologies in the field of microelectronics. His expertise in polysilazane coatings and pattern formation has positioned him as a key player in advancing the capabilities of electronic devices.

Collaborations

Throughout his career, Kurosawa has collaborated with talented individuals such as Yusuke Takano and Jin Li. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Kazunori Kurosawa's contributions to superfine pattern technology exemplify the spirit of innovation in the field of microelectronics. His patents reflect a commitment to advancing technology and improving production methods.

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