Shiga, Japan

Kazunari Terakawa

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: International Business Machines Corporation. Active years: 2007-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazunari Terakawa. Retrieved from https://idiyas.com/inventor/kazunari-terakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Yohkaichi, JP (2007)
  • Shiga-ken, JP (2009)

Company Filing History:


Years Active: 2007-2009

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2 patents (USPTO):Explore Patents

Title: Kazunari Terakawa: Innovator in Pattern Inspection Technology

Introduction

Kazunari Terakawa is a notable inventor based in Shiga-ken, Japan. He has made significant contributions to the field of pattern inspection technology. With a total of 2 patents, his work focuses on enhancing the accuracy and efficiency of pattern profile detection.

Latest Patents

Kazunari Terakawa's latest patents include an inspection apparatus and method for pattern profiles. This innovative apparatus is designed to easily and accurately detect profile errors in patterns that have cross sections with projections and recesses. The inspection apparatus features a plate on which a pattern is mounted, along with light sources that can change the angles of illuminating light emitted onto the pattern. This adjustment can be made within a range of 15 to 75 degrees relative to the top surface of the pattern. Additionally, photodetectors are included to receive reflected light from the pattern at similar angles. The unique aspect of this apparatus is its ability to detect profile errors based on the amount of reflected light from the edge between the top surface and the side surface of each pattern.

Career Highlights

Kazunari Terakawa is currently employed at International Business Machines Corporation (IBM). His work at IBM has allowed him to develop and refine his innovative inspection technologies. His contributions have been instrumental in advancing the capabilities of pattern inspection systems.

Collaborations

Throughout his career, Kazunari has collaborated with notable colleagues, including Mitsuru Uda and Chiaki Oishi. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in the field.

Conclusion

Kazunari Terakawa is a distinguished inventor whose work in pattern inspection technology has made a significant impact. His innovative patents and collaborations highlight his commitment to advancing the field. His contributions continue to shape the future of pattern inspection systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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