The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Oct. 25, 2007
Mitsuru Uda, Shiga-ken, JP;
Kazunari Terakawa, Shiga-ken, JP;
Akira Susuki, Shiga-ken, JP;
Chiaki Oishi, Shiga-ken, JP;
Yasuharu Yamada, Shiga-ken, JP;
Teruhiko Havano, Shiga-ken, JP;
Mitsuru Uda, Shiga-ken, JP;
Kazunari Terakawa, Shiga-ken, JP;
Akira Susuki, Shiga-ken, JP;
Chiaki Oishi, Shiga-ken, JP;
Yasuharu Yamada, Shiga-ken, JP;
Teruhiko Havano, Shiga-ken, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the patternis for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plateon which a pattern is mounted, light sourcesandwhich can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectorsandwhich can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.