Shiga, Japan

Akira Susuki

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Susuki. Retrieved from https://idiyas.com/inventor/akira-susuki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Akira Susuki: Innovator in Pattern Inspection Technology

Introduction

Akira Susuki is a notable inventor based in Shiga-ken, Japan. He has made significant contributions to the field of pattern inspection technology, particularly through his innovative patent that addresses the challenges of detecting profile errors in patterns.

Latest Patents

Akira Susuki holds a patent for an "Inspection apparatus and inspection method for pattern profile." This invention provides a solution for accurately detecting profile errors in patterns that have cross sections with projections and recesses. The inspection apparatus includes a plate for mounting the pattern, light sources that can adjust the angles of illuminating light between 15 to 75 degrees, and photodetectors that receive reflected light at similar angles. The technology is characterized by its ability to detect profile errors based on the amount of reflected light from the edges of the patterns.

Career Highlights

Akira Susuki is associated with International Business Machines Corporation (IBM), where he has been instrumental in advancing inspection technologies. His work has contributed to improving the accuracy and efficiency of pattern inspections in various applications.

Collaborations

Throughout his career, Akira has collaborated with notable colleagues, including Mitsuru Uda and Kazunari Terakawa. These collaborations have fostered innovation and development in the field of pattern inspection.

Conclusion

Akira Susuki's contributions to pattern inspection technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to enhancing accuracy in pattern analysis, which is crucial for various technological applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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