Company Filing History:
Years Active: 2009
Title: Teruhiko Havano: Innovator in Pattern Inspection Technology
Introduction
Teruhiko Havano is a notable inventor based in Shiga-ken, Japan. He has made significant contributions to the field of pattern inspection technology. His innovative work has led to the development of advanced apparatuses that enhance the accuracy of pattern profile detection.
Latest Patents
Havano holds a patent for an "Inspection apparatus and inspection method for pattern profile." This invention is designed to easily and accurately detect profile errors in patterns that have cross sections with projections and recesses. The apparatus includes a plate for mounting patterns, adjustable light sources that emit illuminating light at angles between 15 to 75 degrees, and photodetectors that receive reflected light at similar angles. The technology is characterized by its ability to detect profile errors based on the amount of reflected light from the edges of the patterns.
Career Highlights
Teruhiko Havano is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects in the field of technology and innovation. His work has been instrumental in advancing the capabilities of inspection apparatuses used in various industries.
Collaborations
Havano has collaborated with notable colleagues, including Mitsuru Uda and Kazunari Terakawa. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Teruhiko Havano's contributions to pattern inspection technology exemplify the spirit of innovation. His patent and work at IBM highlight the importance of precision in technological advancements. His efforts continue to influence the field and inspire future innovations.