Osaka, Japan

Kazumi Higashi



Average Co-Inventor Count = 2.8

ph-index = 7

Forward Citations = 240(Granted Patents)


Company Filing History:


Years Active: 1989-2000

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12 patents (USPTO):Explore Patents

Title: Kazumi Higashi: Innovator in Photoresist Technology

Introduction

Kazumi Higashi is a prominent inventor based in Osaka, Japan, known for his significant contributions to the field of photoresist technology. With a total of 12 patents to his name, he has made remarkable advancements that have practical applications in various industries.

Latest Patents

One of his latest patents is a negative photoresist composition that exhibits excellent sensitivity and resolution. This composition adheres tenaciously to substrates, making it advantageous for practical production processes. The formulation incorporates two 1,4-dihydropyridine derivatives as photosensitizers into a polyamic acid, resulting in a highly effective negative photoresist composition. Another notable patent is the polyimide-metal foil composite film, which consists of a conductive metal foil laminated with a polyimide resin layer. This innovative film is designed to serve as a circuit substrate, offering excellent dimensional stability under high temperatures.

Career Highlights

Kazumi Higashi has worked with notable companies such as Nitto Denko Corporation and Nitto Electric Industrial Co., Ltd. His experience in these organizations has allowed him to develop and refine his inventions, contributing to advancements in materials science and engineering.

Collaborations

Throughout his career, Higashi has collaborated with talented individuals, including Amane Mochizuki and Masako Maeda, who have contributed to his innovative projects.

Conclusion

Kazumi Higashi's work in photoresist technology has significantly impacted the industry, showcasing his expertise and innovative spirit. His patents reflect a commitment to advancing technology and improving production processes.

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