Machida, Japan

Kazuko Nakano

This inventor holds 1 USPTO granted patent. Top assignee: Nippon Telegraph and Telephone Public Corporation. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuko Nakano. Retrieved from https://idiyas.com/inventor/kazuko-nakano-w34sy211

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Kazuko Nakano: Innovator in Pattern-Forming Materials

Introduction

Kazuko Nakano is a prominent inventor based in Machida, Japan. She has made significant contributions to the field of materials science, particularly in the development of pattern-forming materials that utilize radiation-sensitive chalcogenides. Her innovative work has implications for various lithographic applications.

Latest Patents

Kazuko Nakano holds a patent for a unique pattern-forming material that comprises a substrate and a radiation-sensitive chalcogenide layer. This layer consists of an amorphous composition containing 75 to 95 mol% of selenium and 5 to 25 mol% of germanium, with a silver layer superimposed. This invention is particularly useful in lithographic applications, showcasing her expertise in the field.

Career Highlights

Kazuko Nakano is associated with the Nippon Telegraph and Telephone Public Corporation, where she has been able to apply her innovative ideas in a practical setting. Her work has not only advanced the technology in her field but has also paved the way for future innovations.

Collaborations

Throughout her career, Kazuko has collaborated with notable colleagues, including Akira Yoshikawa and Haruo Nagai. These collaborations have enriched her research and contributed to the success of her projects.

Conclusion

Kazuko Nakano's contributions to the field of pattern-forming materials highlight her role as a leading inventor. Her innovative patent and collaborations reflect her commitment to advancing technology in lithographic applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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